Mask EDA Workshop
11-12 July 2001

San Francisco, California

(All presentations are in .PDF format)

• Intro
• DuPont Photomasks Inc.
• Intel
• Motorola
• Infineon
• Infineon demo
• Avant
• Cadence
• K2 Technologies
• ASML
• Mentor Graphics
• Numerical Technologies Inc.
• Large File Issues
• Alternative Computing Techniques
• Mask Data Format Standardization
• Leica
• Toshiba
• Selete
• Semi