(EUVL Symposium proceedings are available here)
Source |
||
| Progress in Development of a High Power Source for EUV Lithography based on DPF and LPP | Igor Fomenkov | not available |
| Pinch Plasma EUV Source with Particle Injection | Malcolm W. McGeoch | SoP02_mcgeoch.pdf |
| Scalability study on a low inductance pulsed power generator | Gohta Niimi | SoP03_Niimi.pdf |
| Modification of Z-pinch Plasmas with an External Longitudinal Magnetic Field* | A. Kimura | SoP04Bz_poster.pdf |
| EUV Emission from Z-pinch Plasmas Driven by Ultra-short Current | H. Fukumoto | SoP05shortI_poster.pdf |
| Characteristics of Z-pinch EUV Sources with Tin Target* | C.H.Zhang | SoP06Sn_poster.pdf |
| Optimization of Capillary Z-pinch Discharge Light Source for Lithography | Inho Song | SoP07_song.pdf |
| Study of Xenon Ionization Dynamics and Efficiency of Capillary Discharge EUV Source | Majid Masnavi | SoP08_Masnavi.pdf |
| Development of Plasma Jet Z-Pinch Discharge System for EUV Light Source with High Efficiency and Low Debris Generation | Yusuke Homma | SoP09_yhomma.pdf |
| Development of Pulsed Power Generator for EUV Source | Nobuaki Oshima | SoP10_Oshima.pdf |
| Extreme ultraviolet spectra of discharge sources in xenon and tin:comparison of computer simulations and experimental results | Erik Kieft | SoP11_kieft.pdf |
| The SOARING Micro Plasma Pulse Discharge EUV Source | Peter Choi | SoP12_Choi.pdf |
| All-permanent Magnet ECR Plasma for EUV Light | D. Hitz | SoP13_Hitz.pdf |
| Recent Improvements on AIXUV’s EUV-LAMP | Rainer Lebert | SoP14_Lebert_pt2.pdf |
| Laser-induced EUV Source for Metrology | Christian Peth | SoP15_Peth.pdf |
| Key Issues for the Development of a Modular Laser-plasma Source for EUV Lithography | C. Bonnefoy | SoP16_Bonnefoy.pdf |
| Investigation of Wavelength Dependence of Conversion Efficiency using Xenon Jet for LPP EUV Light Source | Tamotsu Abe | SoP17_Abe.pdf |
| Xe droplet target development for a LPP EUV light source | Masaki Nakano | SoP18_Nakano.pdf |
| Fast continuous supply of cryogenic Xe targets for LPP-EUV source | Takahiro Inoue | SoP19_Inoue.pdf |
| Improvement of EUV conversion efficiency in laser-produced plasmas by Xe cryogenic target | Shuji Miyamoto | SoP20 not available |
| Optimization of extreme ultraviolet yield from a large size continuous water-jet | Chirag Rajyaguru | SoP21_Rajyaguru.pdf |
| Enhancement of EUV emission from a liquid microjet target by use of dual laser pulses | Takeshi Higashiguchi | SoP22_Higashiguchi.pdf |
| Laser-Wavelength Dependence of Laser-produced-plasma EUV Emission | Akihiko Takahashi | SoP23_Takahashi_Corrected_File.pdf |
| Development of EUV light source by laser-produced plasma with Sn nano-particles | Akinaga Koji | SoP24_Koji.pdf |
| EUV Emission from Tin Plasmas Generated with 1.06, 0.53, and 0.26 μm Laser Pulses | M.Yamaura | SoP25_Yamaura.pdf |
| Fabrication of Target for LPP EUVL at Osaka University | Q.Gu | SoP26_Gu.pdf |
| Control of EUV spectral shape and conversion efficiency by the use of low-density SnO2 targets | Tomoharu Okuno | SoP27_Okuno.pdf |
| A novel thin-foil mass limited target for laser-produced EUV source generation | S.Uchida | SoP28_Uchida.pdf |
| Influence of drive pulse duration on EUV emission properties in laser produced tin plasma | Y. Shimada | SoP29_Shimada.pdf |
| Density measurement of extreme ultraviolet emission region in laser-produced Sn plasmas | Y.Tao | SoP30_Tao.pdf |
| Visualization of Xe and Sn Atoms Generated from Laser-Produced Plasma for EUV Light Source | Tanaka Hiroki | SoP31_Hiroki.pdf |
| Charge-state dependence of EUV emission spectra from multiply charged xenon ions | Hajime Tanuma | SoP32_Tanuma.pdf |
| Fundamental Atomic Data for EUV Light Source Development | A.Aguilar | SP33 not available |
| Modeling laser-plasma sources for EUV | Moza Al-Rabban | SoP34_Rabban.pdf |
| Precision 13 nm metrology of the microscopic tin-doped droplet laser-plasma source | C-S Koay S. George | SoP35_Koay.pdf |
| In-band high-resolution imaging of microscopic 13 laser-plasma sources. | Clarisse Mazuir | SoP36_Mazuir.pdf |
| Ion emission characterization from microscopic laser-plasma tin-doped droplet sources | K. Takenoshita | SoP37_Takenoshita.pdf |
| Particulate debris characterization and mitigation from microscopic laser-plasma tin-doped droplet sources | K. Takenoshita | SoP38_Takenoshita.pdf |
| EUV spectroscopy of mass-limited Sn-doped laser plasmas | Simi George | SoP39_George.pdf |
| Progress of High Efficiency Particle-Cluster Tin Target Technologies | Toshihisa Tomie | SoP40_Tomie.pdf |
| Ultra-compact and flexible noble gas filament and spray source for EUV and XUV generation | Bernd Abel | SoP41 not available |
| Laser wavelength scaling of conversion efficiency and fast ion production by a laser produced plasma(LPP)extreme ultlaviolet(EUV)illumination source | Richard J.Anderson | SoP42 not available |
| Radiation transport modeling for Xe and Sn-doped droplet laser-plasma sources | Moza Al-Rabban | SoP43_Rabban.pdf |
| Ionization & Excitation Rates of Multicharged Ions in Non-equilibrium Plasma of EUV Source | Sergey V. Zakharov | SoP44_Zakharov.pdf |
| A Black Box Modelling Engine for EUV Plasma sources | Sergey V. Zakharov | SoP45_Zakharov.pdf |
| Modeling and Simulation of Laser Produced Plasma in EUV Lithography Devices | Ahmed Hassanein | SoP46 not available |
| Modeling MHD, Radiation Transfer, and Photonics in DPP and LPP EUVL Light Sources | Curtis Rettig | SoP47_Rettig.pdf |
| The Role of Interference and Correlations in 13.5 nm Radiations of Sn and Xe Atomic Ions-- For Precise and Accurate Determination of Sprctral Lines | Fumihiro Koike | SoP48_Koike.pdf |
| Atomic models for radiation transport in laser plasma hydrodynamic simulation of EUV light source | Takeshi Nishikawa | SoP49_nishikawa.pdf |
| Numerical Analysis of Extreme Ultra-Violet Emission from Laser-Produced Tin Plasmas | Atsushi Sunahara | SoP50_Sunahara.pdf |
| Numerical calculation of EUV emission for LPP scheme with Sn | Tohru Kawamura | SoP51_Kawamura_correct.pdf |
| Emissivity and opacity of Xe and Sn based on a detailed atomic model | Akira Sasaki | SoP52_sasaki.pdf |
| EUV spectra from Xe10+ ions measured from LHD and spectral analysis by collisional radiative models | Takako Kato | SoP53 not available |
| Theoretical Simulation for Spectra Emitted from Sn and Xe ions as an EUV Light Source | Takashi Kagawa | SoP54 not available |
| Theoretical Atomic Structure Data for Sn and Xe ions as an EUV Light Source | T. Kagawa | SoP55_Kagawa.pdf |
Contamination |
||
| Understanding Implantation,Diffusion and Surface Contamination of Advanced Fuels with Various Condenser Optic Materials | Huatan Qiu | CoP01_Qiu_Neuman.pdf |
| Using Gibbsian Surface Segregation and Radiation-Induced Transport for Improved EUV Optics Lifetime | Brian E. Jurczyk | CoP02_Qiu.pdf |
| Advanced Fuel Ion-Surface Modeling Relevant to the Surface Cleaning of Optics by Plasma Exposure(SCOPE)Experiment | Darren A. Alman | CoP03_Alman.pdf |
| SCOPE:Surface Cleaning of Optics by Plasma Exposure Experiment | Martin J. Neumann | CoP04 not available |
| Debris Characterization from a Z-Pinch Extreme Ultraviolet Light Source | Erik Antonsen | CoP05_Thompson.pdf |
| Secondary RF Plasma System for Mitigation of EUV Source Debris and Advanced Fuels | Michael A. Jaworski | CoP06_Jaworski.pdf |
| Deposition/Erosion and Damage Modeling of Si/Mo Multilayer Mirrors during Operation of Advanced Fuel Laser EUV/SXR Sources | Darren A. Alman | CoP07_Spencer.pdf |
| Debris shield effect on mitigation of discharge debris | Takahiro Shirai | CoP08_Shirai.pdf |
| Time Exposure and Surface Analysis of EUV Light and Debris Exposed Condenser Optics | Darren A. Alman | CoP09_Alman.pdf |
| Evaluating the SCOPE of Advanced Fuel Candidates from a Condenser Optic Perspective | Brian E. Jurczyk | CoP10_Jurczyk.pdf |
| Particle-Surface Interactions in EUV Lithography Collector Mirrors | J. P. Allain | CoP11 not available |
| Debris Mitigation using Magnetic Field in Laser Produced Plasma EUVL Source | Y. -G. Kang | CoP12 not available |
| Modeling for charge transfer of highly ionized Xe ions produced by laser produced plasma | Iwao Nishiyama | CoP13_Nishiyama.pdf |
| The erosion of materials exposed to a laser-produced plasma extreme ultraviolet illumination source | Richard J. Anderson | CoP14 not available |
| Characterization of Debris Emitted from Laser Produced Tin Plasmas for EUV Lithography Application | Shinsuke Fujioka | CoP15_Fujioka.pdf |
| Outgassing characteristics of structural materials for EUVL | Kazuhiro Hamamoto | CoP16 not available |
| A model to describe surface physics in EUVL optics mirror contamination | Yoshio Gomei | CoP17_Gomei.pdf |
| Measurements of reflectance drop by contaminations on multilayer mirrors at NewSUBARU | Yukinobu Kakutani | CoP18_Kakutani.pdf |
| Characterization of capped multilayer mirrors using XPS, AES and SIMS | Hiromitsu Takase | CoP19finalsubmission.pdf |
| Apparatus for contamination control development in EUVA | Takashi Aoki | CoP20_Aoki.pdf |
| Stimulated Photo-resist Outgassing under High Power Pulsed EUV illumination | Anthony Keen | CoP21.pdf |
| Static and Dynamic Outgassing of Actuated Devices in EUVL Vacuum Systems | Neil Condon | CoP22.pdf |
| Rapid Attainment of Vacuum System Base Pressure – Combination of Pumping & Purging | Andy Harpham | CoP23.pdf |
| PPT (10-9 mbar) Sensor for Trace Detection of Organic Contamination in Vacuum Environments | Robert B Grant | CoP24.pdf |
Resist |
||
| Facility Considerations for International SEMATECH's EUV Resist Test Center | Andrew C. Rudack | ReP01_rudack.pdf |
| Status update EXCITE, the MEDEA+ Extreme UV Consortium for Imaging Technology | Peter Zandbergen | ReP02_Zandbergen.pdf |
| EUV Resist Patterning Performance from the Intel Microexposure Tool (MET) | Wang Yueh | ReP03_Yueh.pdf |
| Novel Evaluation System for EUV Resist in NewSUBARU | Seung Yoon Lee | ReP04 not available |
| Development of Fast Photospeed Chemically Amplified Resist Employing Sulfonium Salts as Photo-acid Generator in EUV Lithography | Takeo Watanabe | ReP05 not available |
| Negative Resists for EUV Lithography Based on Photoinduced Diels-Alder Cycloaddition | Igor Luzinov | ReP06 not available |
| Synthesis and Characterizations of Poly(oxyethylene) Derivatives and Polysiloxane Derivatives for Extreme-UV Lithography | Hyun-Soo Ryu | ReP07_Ryu.pdf |
| Performance of EUV Photoresists on the ALS Micro Exposure Tool | Robert L. Brainard | ReP08 not available |
| Chemical Amplifiable Silicon Polymers | J. Pablo Bravo | ReP09 not available |
| EUV Resist Sensitivity to Out of Band Radiation | Heidi Cao | ReP10_Cao.pdf |
| Characterization of EUV-Ougassing of different Resist Platforms | Wolf-Dieter Domke | ReP11_Domke.pdf |
| Quantification of EUV Resist Outgassing | Heidi Cao | ReP12_Cao.pdf |
| Supercritical Drying of Sub-50 nm Resist Patterns in EUV Lithography | Yukiko Kikuchi | ReP13_Kikuchi.pdf |
Metrology |
||
| Precise at-wavelength metrology with the EUV tube | André Egbert | MeP01_Egbert.pdf |
| Tools for EUVL-source characterization and optimization | Thomas Mißalla | MeP02_Missalla.pdf |
| Characterization of EUV Detectors and Tools at NIST | Steve Grantham | MeP03_Grantham.pdf |
| EUV Dose Measurement System | Raj Korde | MeP04_Korde.pdf |
| The Growth of NIST EUVL Metrology Programs | Shannon Hill | MeP05_Hill.pdf |
| High-accuracy EUV reflectometry at PTB | Frank Scholze | MeP06_Scholze.pdf |
| Grazing incidence EUV reflectometer using a xenon pinch plasma source | Klaus Bergmann | MeP07_Bergmann.pdf |
| High Speed Reflectometer for EUV Mask-Blanks | Christian Wies | MeP08_Wies.pdf |
| Results from our recently delivered EUV Laser Plasma Reflectometer for the measurement reflectivity and uniformity of EUV Lithography Mask Blank Multilayer Coatings | Rupert C. C. Perera | MeP09_Perera.pdf |
| Design and manufacture of high-precision dilatometer for low-thermal-expansion materials for EUVL | Yoshimasa Takeichi | MeP10_Takeichi.pdf |
| Modeling of the Defect Inspection Sensitivity of a Confocal Microscope | Eric M. Gullikson | MeP11_Gullikson.pdf |
| Actinic Detection and Signal Characterization of Multilayer Defects on EUV Mask Blanks | Yoshihiro Tezuka | MeP12_Tezuka.pdf |
| Actinic mask inspection using EUV microscope | Hiroo Kinoshita | MeP13_kinoshita.pdf |
| Principle of Absolute Wavefront Measurement by a Point Diffraction Interferometer | Zhu Yucong | MeP14_zhuYucong.pdf |
| Application of cross-grating interferometer for EUV wavefront measurement | Seima Kato | MeP15_Kato.pdf |
Multilayer |
||
| Thermal and stress management of EUV multilayers | Saša Bajt | MuP01_Sasa_Bajt.pdf |
| Recent Results of Multilayer MoSi Coatings on EUVL Optics | Michael D. Kriese | MuP02_Kriese.pdf |
| An ellipsometric thickness monitor with layer-by-layer analysis for EUV multilayer optics fabrication | Toshihide Tsuru | MuP03_Tsuru.pdf |
| Measurement of EUV scattering from Mo/Si multilayer mirrors | Noriaki Kandaka | MuP04_kandaka.pdf |
| Mo/Si multilayer mirror deposited with ion beam sputtering using Kr gas | Tetsuya Tomofuji | MuP05_Tomofuji.pdf |
| Out of band reflectivity of EUV multi-layer coatings | Manish Chandhok | MuP06 not available |
| Precise control of thickness distribution of molybdenum/silicon multilayer coatings for EUV optics using a moving deposition shutter system | Masayuki Shiraishi | MuP07_shiraishi.pdf |
| Measurement of phase shift on EUV multilayer reflection using EUV standing waves | Akira Miyake | MuP08_Miyake.pdf |
| High-temperature MoSi2/Si and Mo/C/Si/C multilayer mirrors | Torsten Feigl | MuP09_Feigl.pdf |
| A novel dual ion beam sputter deposition system for implementing low defect density and high-quality EUVL masks | Amer Tarraf | MuP10_Tarraf.pdf |
| Impact of Multi-Layer Deposition Method on Hole/Scratch Type Defects on Photomask Blanks | Jerry Cullins | MuP11Cullins.pdf |
| Influence of glass substrate surface roughness on EUV reflectivity of Mo/Si multilayer | Shinji Miyagaki, | MuP12_Miyagaki.pdf |
| Designing a Clean Multilayer Deposition Process-Computational Model of particle Transport | C.C Walton | MuP13_Walton.pdf |
| Deformation of Mo/Si multilayer thin film using electron beam irradiation | Won IL Ryu | MuP14_Ryu.pdf |
| Characteristics of Mo/Ru/Si multilayer reflector structure | Taegeun Kim | MuP15_TaegeunKimHanyangUniv.pdf |
| Stabilization of residual stress of Mo/Si multilayer for extreme ultraviolet lithography | Sukpil Kim | MuP16_Kim_Sukpil.pdf |
| Control of intermixing layer in Mo/Si multilayer mirror for extreme ultraviolet lithography | Hoon Kim | MuP17 not available |
Mask |
||
| Thermal Expansion property and Surface Finish capability of CLEARCERAM®-Z series for EUVL Photomask Substrate Application | Kousuke Nakajima | MaP01_Tarraf.pdf |
| Challenges to EUV mask blanks volume production | Frank Sobel | MaP02_seitz_sobel.pdf |
| Analysis of defects on extreme ultraviolet mask blanks and substrates | Emily Y. Shu | MaP03_Shu.pdf |
| Investigation of the printability of defects in EUVL mask blank | V. Farys | MaP04_farys.pdf |
| Simulatons of patterned EUVL multilayer mask with embedded defects using rigorous coupled-wave analysis | Seong-Sue Kim | MaP05_S_Kim.pdf |
| Simulation Analysis of Defect Repair Methods for EUVL Mask Blanks | Takeo Hashimoto | MaP06_Hashimoto.pdf |
| Asymmetry in mask pattern correction for binary and attenuated phase shift masks by off-axis incident light | Minoru Sugawara | MaP07_Sugawara.pdf |
| A New Absorbing Stack for EUV Masks | C. Charpin Nicolle | MaP08_Nicolle.pdf |
| Numerical and Experimental Study of EUV Mask Interface Roughness, Capping Layer Oxide Growth, and Phase Shifting Feasibility | Eric Cotte | MaP09_Cotte.pdf |
| Evaluation of Pattern Fidelity in EUVL Using the High-Numerical-Aperture Small-Field EUV Exposure Tool (HiNA) | Yuusuke Tanaka | MaP10_Tanaka.pdf |
| Dry Etching and Defect Repair of TaGeN Absorber Layer for EUVL Mask | Tsukasa Abe | MaP11_abe.pdf |
| Repair of EUV Masks Using a Nanomachining Tool | Jan Hendrik Peters | MaP12_Peters.pdf |
| Damage Free Laser Shock Cleaning of EUV Mask Blank with Si Capping Layer | Sang-Ho Lee | MaP13_Lee.pdf |
| EUV Mask Chucking Study – Particle Mitigation and Dynamic Flatness | Ichiro Okabe | MaP14_Okabe.pdf |
Mask Handling |
||
| Design and Preliminary Results of an Atmospheric Chamber to Evaluate Nanoparticle Protection Schemes for EUVL Carrier System | Se-Jin Yook | HaP01_Pui.pdf |
| Improved Reticle Carrier Design Through Numerical Simulation | A. S. Geller | HaP02_Geller.pdf |
| Modeling of Thermophoretic and Electrophoretic Effects for Particle Transport and Deposition in EUVL Systems | Heinz Fissan | HaP03_Fissan.pdf |
| Use of Data Matrix symbology for Automated Identification of EUV Masks | Dave Krick | HaP04_White.pdf |
Optics |
||
| Collector Optics for EUV Lithography | Piotr Marczuk | OpP01.pdf |
| Multilayer Collector Optics for Operation in EUVL Source Environments with Alternative Fuels | Regina Soufli | OpP02_Soufli.pdf |
| Surface Roughness of Optical Substrate Finished by ion Beam Figuring | Jun Taniguchi | OpP03_taniguchi.pdf |
| Development of Ion Beam Figuring System for Mirror Shape Correction of Minute Area | Manabu Ando | OpP04_Ando.pdf |
| Basic Examinations of Shape Correction Machining of Minute Area by Ion Beam Figuring | Manabu Ando | OpP05_Ando.pdf |
| Prevention Effect of Insulator Substrate Charge-up During Ion Beam Figuring | Jun Taniguchi | OpP06_Taniguchi.pdf |
| Progress in EUV Optics a SAGEM | Roland GEYL | OpP07_Geyl.pdf |
| Networks of Local Minima for EUV Mirror Systems | Oana Marinescu | OpP08_Marinescu.pdf |
| Dominant Aberration of EUVL Off-axis Reflective Imaging Systems and Its Elimination | Seunghyuk Chang | OpP09_Chang.pdf |
| Projection Optics Set-3 for High Numerical Aperture EUV Exposure Tool (HiNA) | Tetsuya Oshino | OpP010_oshino.pdf |
Tool |
||
| Initial Cost of Ownership Analysis for the 45nm Half Pitch (HP) / 2009 Applications | Phil Seidel | ToP01_Seidel.pdf |
| Radiation Driven Plasma | M.H.L.v.d.Velden | ToP02_Velden.pdf |
| Vacuum Mechatronics in the ASML EUV Alpha Demo Tool | G. van Baars | ToP03_van_Baars.pdf |
| h3>Late News | ||
| Stopping Ions, Clusters and Out-of-band Radiation by Kr for Clean EUV Sources | F. Flora | LnP01_Flora.pdf |
| Progress in the Optics Lifetime Programme for ASML EUV Lithographic Tools | Bas Mertensa | LnP02 not available |
| Molecular Glass Photoresists for EUV Lithography | Da Yang | LnP03_Yang.pdf |
| One Small Step: World’s First Integrated EUVL Process Line | Eric M Panning | LnP04_Panning.pdf |
| EUVL Multilayer Coating Development | E. Louis | LnP05_Louis_poster.pdf |
| EUV Hartmann Wavefront Sensor | D. Douillet | LnP06 not available |
| AFOSUB: Wavefront Sensing for Subnanometric Metrology | P. Zeitoun | LnP07 not available |
| New NSF Center for EUV Science and Technology | D.Attwood | LnP08_Attwood.pdf |
Copyright 2008, SEMATECH Inc.
Privacy Policy | Trademark and Legal Notices