157 nm Technical Data Review

12-13 December 2001
Orlando, Florida

(All presentations are in .PDF format)

• Introduction and U.S. Program Overview
  Rich Harbison / ISMT
• IMEC Program
  Kurt Ronse / IMEC

Materials

• CaF2
  John Schupp / ACT Optics
• CaF2 for 157nm Lithography
  Valery Prunier / Saint-Gobain
• Schott Lithotec Status for 157nm Grade CaF2
  Konrad Knapp / Schott Lithotec
• Method & Apparatus for Purification and Crystal Plate Growth of CaF2
  Kiril Pandelisev / Single Crystal Tech.; Shariar Motakef / CAPE Simulations
• Modified Fused Silica
  Yoshiaki Ikuta / Asahi Glass
• Materials Evaluation
  Yasuai Fukuda / ASET

Reticles, Reticle Protection / Defect Reduction

• Development of Polymeric Materials for 157nm
  Ikuo Matsukura / Asahi Glass
• Polymer Pellicle
  Roger French / DuPont
• Current Status of Hard Pellicle
  Shinya Kikugawa / Asahi Glass
• Pellicle / Reticle Interactions
  Roxann Engelstad
• 157nm Mask Issues
  Joe Laganza / ASML-Wilton
• Hard Pellicle Study for 157nm Lithography
  Emily Shu / Intel-ASML
• Pellicle Strategy Meeting Read-Out
  Chris Van Peski / ISMT
• 157nm Mask Materials
  Jerry Cullins / ISMT
• Mask Infrastructure Development
  Kurt Kimmel / ISMT
• Phase Shifting Attenuator Material Screening
  Bruce Smith / RIT

Resist

• Fluoropolymers for 157nm
  Mike Crawford / DuPont
• JSR 157nm Photoresist Update
  Mikio Yamachika / JSR
• Fluoropolymer Resist Technology
  Cheng Bai Xu / Shipley
• Study of PAG Size Effect on Lithographic Perf.
  Alan Kozlowski / Sumitomo
• A 1st-Generation Commercial 157nm Resist
  Ralph Dammel / Clariant
• Cornell Resist Program
  Chris Ober / Cornell University
• University Resist Program
  Will Conley / ISMT (Univ. Programs)

Coatings

• Coatings
  Dick Merk / Acton
• Challenges of Long-Term Laser Durability of Optical Coatings
  Vlad Liberman
• Low Loss Optical Coat for 157nm Lithography
  Akira Matsumoto / ASET

Contamination

• Controller Contamination and Cleaning under 157nm Laser Irradiation
  Ted Bloomstein / MIT/LL
• Contamination
  Jeff Meute / ISMT

Laser and Exposure Tools

• Technical Status Report on F2 Lasers
  Klaus Vogler / Lambda Physik
• Status of 157nm System Development at ASML/CZO
  Jan Mulkens / ASML
• Development of 157nm Exposure Tools
  Mamoru Miyawaki / Canon
• Nikon F2 Exposure Tools
  Soichi Owa / Nikon
• Ultratech Stepper
  Roger Sumner / Ultratech Stepper

Posters

• Stress Optical Co-Efficients of 157nm Materials
  John Burnett / NIST
• Ca1- xBa xF2 and Ca1- xSr xF2 Mixed Crystals as Potential Solution to Intrinsic Birefringence Problem for 157nm Lithography
  John Burnett / NIST